The current toolset offered by NRL to users and CNMS staff includes a photomask writing capability as a part of fabrication workflows that rely on conventional photolithography or its combination with nanoscale e-beam lithography and/or direct write patterning techniques. The Heidelberg DWL66 mask writer is a direct laser tool used primarily for making photomasks for contact photolithography. The two write heads offer different combinations of write speed and resolution.
Specifications/Capabilities
Light source: 405 nm diode laser
- Resolution: 1 µm (4mm head), 4 µm (20 mm head)
- Write speed: 36 hours (4mm head); 1 hour (20 mm head) per 4” wafer
