HIPPA is a custom-built direct current plasma enhanced chemical vapor deposition (DC-PECVD) system for carbon nanofiber (CNF) and carbon nanospike (CNS) synthesis. Carbon nanospikes and vertically aligned CNFs provide an electrically conductive interface for nano-biological applications. Also, CNSs have been used in electrochemistry for CO2 reduction to ethanol and heavier carbon chains.
Specifications/Capabilities
- Accommodates 4-inch wafer or substrate.
- Heated Platen up to 700 °C,
- Gases are C2H2 and NH3,
- Vacuum range 4 torr to 50 torr,
- Plasma .25A to 4A.
