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Atomic-Scale Imaging of Polarization Switching in an (Anti-)Ferroelectric Memory Material: Zirconia (ZrO2)

Publication Type
Conference Paper
Journal Name
IEEE Symposium on VLSI Technology
Book Title
2020 IEEE Symposium on VLSI Technology
Publication Date
Page Numbers
1 to 2
Publisher Location
New Jersey, United States of America
Conference Name
2020 IEEE Symposium on VLSI Technology
Conference Location
Honolulu, Hawaii, United States of America
Conference Sponsor
IEEE
Conference Date
-

Direct, atomic-scale visualization of polarization switching in a functional, polycrystalline, binary oxide via in-situ high-resolution transmission electron microscopy (HRTEM) biasing is reported for the first time. Antiferroelectric (AFE) ZrO2 was used as the model system, which is important for commercial DRAMs and as emerging NVMs (through work-function engineering). We observed (1) clear shifting and coalescing of domains within a single grain, and (2) dramatic changes of the atomic arrangements and crystalline phases—both at voltages above the critical voltage measured for AFE switching. Similar synergistic in-situ structural-electrical characterization can pave the way to understand and engineer microscopic mechanisms for retention, fatigue, variability, sub-coercive switching and analog states in ferroelectric and AFE-based memory devices.