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Block copolymer nanolithography for the fabrication of patterned media....

Publication Type
Journal
Journal Name
Materials Research Society Symposium Proceedings
Publication Date
Page Numbers
152 to 157
Volume
1032

Abstract
Bit patterned perpendicular media has the potential to increase the density of
magnetic recording beyond what can be achieved by granular media. Self assembling
diblock copolymers are of interest as templates for patterned media, as they potentially
provide a low cost fabrication route. A method to fabricate the desired pattern using
cylinder forming diblock copolymers of (PS-b-PMMA) as template is reported. Upon
phase separation hexagonally packed cylinders of the minority phase (PMMA)
surrounded by the continuous majority phase (PS) are obtained. The processing sequence
began with spin coating the block copolymer on a suitable substrate, followed by
annealing the block copolymer thin film in vacuum to orient it perpendicular to the
substrate. Block copolymer templates were obtained by glacial acetic acid treatment
which opened the pores in the block copolymer thin film. Ni was electrodeposited in the
block copolymer templates and this pattern was then transferred onto the underlying
substrate by ion milling