Thermo Scientific Helios 5 Hydra UX Dual Beam combines high throughput plasma focused ion beam (PFIB) technology with a high-resolution scanning electron microscope (SEM). Multi-ion species allows options to choose optimal ion beam for wide variety of samples, brings cutting edge capabilities and flexibility to researchers needing to create, modify, and characterize complex structures at nanometer scale. Precise focused ion beam (FIB) milling and etching combined with metal/insulator deposition complements and extends the application range for nanoscale prototyping, machining, 2D and 3D-characterization, and analysis. The ability to choose between 4 ion species, two of which are reactive (O and N) and two of which are inert (Xe and Ar), opens new possibilities for functionalizing materials and introducing defects in a controlled fashion.
Specifications/Capabilities
- Extreme high-resolution field emission SEM Column with Magnetic immersion objective lens.
- Beam deceleration with stage bias from 0 V to -4 kV.
- Ion species (primary ion beam): Xe, Ar, O, N
- Ion beam energy range: 500 V - 30 kV
- Ion-beam current range: 1.5 pA to 2.5 μA
- Sample stage tilt range: -38° to +60°
- Gas chemistry options: Platinum and Tungsten metal deposition, SiO2 insulator deposition and XFe2 based reactive etching.
