Optical Thin Film Characterization:
Filmetrics F50-UV Thin-Film Mapping System & Horiba Jobin Yvon UVISEL FUV-VIS-NIR Spectroscopic Ellipsometer
Filmetrics F50-UV Thin-Film Mapping System & Horiba Jobin Yvon UVISEL FUV-VIS-NIR Spectroscopic Ellipsometer
Metrology of thin films is critical to ensuring wafer or chip-scale devices or structures will be consistent with their intended design. Thickness of films, residual stress, and optical properties of films may all play an important role is a successful nanofabrication process. In the NRL cleanroom we have a large suite of characterization tools, with optical thin film characterization being integral to nanofabrication workflows. A Filmetrics reflectometer with wafer mapping capability is a rapid method of measuring transparent film thickness, and how it varies across a wafer. Spectroscopic ellipsometry with the Horiba Jobin Yvon instrument offers even more insights into transparent and semitransparent film properties such as roughness and optical constants.
Specifications/Capabilities
Horiba Jobin Yvon UVISEL FUV-VIS-NIR Spectroscopic Ellipsometer
Filmetrics F50-UV Thin-Film Mapping System