Abstract
Polarization switching in ferroelectric and multiferroic materials underpins a broad range of current and emergent applications ranging from random access memories to field effect transistors, and tunneling devices. Switching in these materials is exquisitely sensitive to local defects and microstructure on the nanometer scale, necessitating spatially resolved high resolution studies of these phenomena. Classical Piezoresponse Force Microscopy and spectroscopy, while providing necessary spatial resolution, are fundamentally limited in data acquisition rates and energy resolution. This limitation stems from their two-tiered measurement protocol that combines slow (~1 s) switching and fast (~10 kHz – 1 MHz) detection waveforms. Here, we develop an approach for rapid probing of ferroelectric switching using direct strain detection of material response to probe bias. This approach, facilitated by high-sensitivity electronics and adaptive filtering, enables spectroscopic imaging at a rate 3,504 times faster the current state of the art; achieving high-veracity imaging of polarization dynamics in complex microstructures.
