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Publication

Depth-resolved residual strain in MoN/Mo nanocrystalline films...

by Gang Chen, Dileep Singh, Osman Eryilmaz, Jules Routbort, Bennett C Larson, W. Liu

Publication Type

Journal

Journal Name

Applied Physics Letters

Publication Date

October, 2006

Volume

89

Issue

17

Researchers

Ben C Larson

Ben C Larson

Organizations

Physical Sciences Directorate

Materials Science and Technology Division

Foundational Materials Science Section

Neutron and X-Ray Scattering Group

Oak Ridge National Laboratory
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Oak Ridge, TN 37830

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