Publication Type
Book Chapter
Publication Date
Page Numbers
1 to 10
Publisher Name
Elsevier
Publisher Location
New York, New Jersey, United States of America
Abstract
Ellipsometry is a technique often used to measure the thickness and properties of a thin film. This article covers the instrumental, theoretical, and practical aspects of this technique. Notably, different types of instruments including nulling ellipsometer, rotating compensator ellipsometer, and photoelastic modulator ellipsometer designs are presented. Elements of proper data analysis are also included, such as the use of an error-based figure of merit.
