Publication Type
Journal
Journal Name
Journal of Materials Chemistry
Publication Date
Page Numbers
2080 to 2091
Volume
1
Issue
11
Abstract
Block copolymers with metals confined in one or more blocks are emerging as candidate materials for nanomanufacturing applications due to their unprecedented nanoscale pattern transfer capabilities. In this article we highlight recent developments in metal-containing block copolymers in terms of their novel synthetic methodologies with particular emphasis on sequential infiltration synthesis, their
hierarchical self-assembly from nano, meso, and submicron scales, and their applications as an etch mask for high-throughput, high aspect-ratio nano and meso scale patterning.