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Excimer Laser Etching...

by Lynn A Boatner, Hu F Longmire, Christopher M Rouleau, Allison S Gray
Publication Type
Journal
Journal Name
Advanced Materials and Processes
Publication Date
Page Numbers
39 to 39
Volume
166
Issue
4

Excimer laser radiation at a wavelength of  = 248 nm represents
a new etching method for the preparation of metallographic
specimens. The method is shown to be particularly effective
for enhancing the contrast between different phases in a multiphase
metallographic specimen.