Abstract
Chemical analysis at the nanoscale is critical to advance our understanding of materials and systems from medicine and biology to material science and computing. Macroscale-observed phenomena in these systems are in the large part driven by processes that take place at the nanoscale and are highly heterogeneous. Therefore, there is a clear need to develop a new technology that enables correlative imaging of material functionalities with nanoscale spatial and chemical resolutions that will enable us to untangle the structure–function relationship of functional materials. Therefore, here, we report on the analytical figures of merit of the newly developed correlative chemical imaging technique of helium ion microscopy coupled with secondary ion mass spectrometry (HIM-SIMS) that enables multimodal topographical/chemical imaging of organic and inorganic materials at the nanoscale. In HIM-SIMS, a focused ion beam acts as a sputtering and ionization source for chemical analysis along with simultaneous high-resolution surface imaging, providing an unprecedented level of spatial resolution for gathering chemical information on organic and inorganic materials. In this work, we demonstrate HIM-SIMS as a platform for a next-generation tool for an in situ material design and analysis capable of down to 8 nm spatial resolution chemical imaging, layered metal structure imaging in depth profiling, single graphene layer detection, and spectral analysis of metals, metal oxides, and polymers.
