Publication Type
Journal
Journal Name
Journal of Materials Chemistry A
Publication Date
Page Numbers
59 to 62
Volume
1
Issue
10.1039
Abstract
Freestanding silicon films with a thickness ranging from 1 nm to several micrometers were prepared by Cat-CVD onto ionic liquid ([BMIM][BF4]) surfaces for the first time. The films, obtained without a solid substrate, can be facilely characterized by TEM and AFM to study the film formation and growth process.
