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Nanotransfer Printing Using Plasma Etched Silicon Stamps and Mediated by In-Situ Deposited Fluoropolyme...

by Deepak Bhandari, Ivan I Kravchenko, Nickolay V Lavrik, Michael J Sepaniak
Publication Type
Journal
Journal Name
Journal of the American Chemical Society
Publication Date
Page Numbers
7722 to 7724
Volume
133
Issue
20

This communication describes a simple method that
uses a thin film of octafluorocyclobutane (OFCB) polymer for
efficient nanoscale transfer printing (nTP). Plasma polymerization of
OFCB produces a Teflon-like fluoropolymer which strongly adheres
and conformally covers 3-D inorganic stamp. The inherently low
surface energy of in-situ deposited OFCB polymer on nanoscale
silicon features is demonstrated as a unique nanocomposite stamp
to fabricate various test structures with improved nTP feature
resolution down to sub 100 nm.