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Observed volatilization behavior of silicon carbide in flowing hydrogen above 2000 K...

by Kelsa Benensky, Kurt A Terrani, Steve Zinkle
Publication Type
Journal
Journal Name
Journal of the American Ceramic Society
Publication Date
Page Numbers
7159 to 7171
Volume
103
Issue
12

The intrinsic compatibility of silicon carbide (SiC) and hydrogen (H2) at high temperatures (2000‐2473 K) and pressure near one atmosphere was evaluated through a combination of thermodynamic calculations and hot hydrogen exposure testing. Thermodynamic calculations predict the decomposition of SiC in a hydrogen environment to form free silicon (Si) and free carbon (C). Free Si is predicted to vaporize from the surface as a volatile species, while free C may interact with H2 to form the hydrocarbons CH4 (T < 2100 K) or C2H2 (T > 2100 K). Coupons of high purity chemical vapor deposition (CVD) β‐SiC were exposed to slowly flowing hydrogen at temperatures ranging between 2000 and 2473 K. SiC experienced active attack as the result of H2 exposure, exhibiting linear weight loss kinetics and an Arrhenius dependence of weight loss on exposure temperature. The linear volatilization constant was experimentally evaluated to correspond with an activation energy of 370 ± 18 kJ/mol. Due to the dependence of observed corrosion rates on gas velocity, corrosion of SiC in flowing H2 was determined to be governed by external mass transfer of volatile Si species through the boundary layer. Experimentally derived mass losses were in good agreement with mass losses predicted by a boundary layer limited gas diffusion model.