Publication Type
Journal
Journal Name
IEEE Transactions on Instrumentation and Measurement
Publication Date
Page Numbers
1132 to 1140
Volume
60
Issue
4
Abstract
This paper describes a highly accurate dose control
circuit (DCC) for the emission of a desired number of electrons
from vertically aligned carbon nanofibers (VACNFs) in a massively
parallel maskless e-beam lithography system. The parasitic
components within the VACNF device cause a premature termination
of the electron emission, resulting in underexposure of the
photoresist. In this paper, we compensate for the effects of the
parasitic components and noise while reducing the area of the chip
and achieving a precise count of emitted electrons from the
VACNFs to obtain the optimum dose for the e-beam lithography.
