Publication

Single Hf Atoms Inside the Ultrathin SiO₂ Interlayer between a HfO₂ Dielectric Film and the Si Substrat...

by Sergey Rashkeev, Klaus Van Benthem, Sokrates T Pantelides, Stephen J Pennycook

Publication Type

Journal

Journal Name

Microelectronics Engineering

Publication Date

April, 2005

Page Numbers

416 to 419

Volume

Single Hf Atoms Inside the Ultrathin SiO2 Interlayer between a HfO2 Dielectric Film and the Si Substrat...