Publication Type
Book Chapter
Publication Date
Page Numbers
71 to 78
Publisher Name
Unknown
Publisher Location
Oxford, United Kingdom
Abstract
We present here a novel method for the preparation of heterogeneous catalysts. This technique relies on the physical vapor deposition technique of magnetron sputtering. The magnetron sputtering method entails the sputtering of a high purity metal target with an argon plasma to produce an atomic metal flux onto a constantly tumbling support material.
