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This invention is directed to a process of manufacturing of complex three dimensional devices.  The invention process employs a technology to produce a wide variety of functional nanomaterials (magnetic, optical, electrical...).  The nanomaterials are then deposited,

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The invention relates to a sputtering target for carrying out a Physical Vapor Deposition (PVD) coating process and more specifically, a PVD coating process where the sputtering target is sputtered by bombardment with gas atoms and/or ions and a layer consisting of a plurality