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Media Contacts
Benjamin Manard has been named to the editorial board of Applied Spectroscopy Practica, serving as an associate editor.
Three scientists from the Department of Energy’s Oak Ridge National Laboratory have been elected fellows of the American Association for the Advancement of Science, or AAAS.
Seven scientists at the Department of Energy’s Oak Ridge National Laboratory have been named Battelle Distinguished Inventors, in recognition of their obtaining 14 or more patents during their careers at the lab.
Eight ORNL scientists are among the world’s most highly cited researchers, according to a bibliometric analysis conducted by the scientific publication analytics firm Clarivate.
Sheng Dai, a Corporate Fellow and section head at the Department of Energy’s Oak Ridge National Laboratory, has been selected by the DOE Office of Science as a 2023 Distinguished Scientist Fellow.
Researchers at the Department of Energy’s Oak Ridge National Laboratory and their technologies have received seven 2022 R&D 100 Awards, plus special recognition for a battery-related green technology product.
A world-leading researcher in solid electrolytes and sophisticated electron microscopy methods received Oak Ridge National Laboratory’s top science honor today for her work in developing new materials for batteries. The announcement was made during a livestreamed Director’s Awards event hosted by ORNL Director Thomas Zacharia.
Ten scientists from the Department of Energy’s Oak Ridge National Laboratory are among the world’s most highly cited researchers, according to a bibliometric analysis conducted by the scientific publication analytics firm Clarivate.
Six scientists at the Department of Energy’s Oak Ridge National Laboratory were named Battelle Distinguished Inventors, in recognition of obtaining 14 or more patents during their careers at the lab.
Seven ORNL scientists have been named among the 2020 Highly Cited Researchers list, according to Clarivate, a data analytics firm that specializes in scientific and academic research.